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physical method Patterned wafer

silicon

2inch 3inch 4inch 5inch 6inch 8inch

round hole array/square hole array/customization

sappire

2inch 3inch 4inch 5inch 6inch 8inch

round hole array/square hole array/customization

germanium

2inch 3inch 4inch 5inch 6inch 8inch

round hole array/square hole array/customization

quartz

2inch 3inch 4inch 5inch 6inch 8inch

round hole array/square hole array/customization

metal

2inch 3inch 4inch 5inch 6inch 8inch

round hole array/square hole array/customization

etching method

patterned wafer

material

wafer size

Pattern

line width

registration accuracy

depth of pattern

process before etching

silicon

2inch 3inch 4inch 5inch 6inch 8inch

round hole array/square hole array/customization

300nm - 15000nm

>=30nm

customization

Photolithography

sappire

2inch 3inch 4inch 5inch 6inch 8inch

round hole array/square hole array/customization

300nm - 15000nm

>=30nm

customization

Photolithography

germanium

2inch 3inch 4inch 5inch 6inch 8inch

round hole array/square hole array/customization

300nm - 15000nm

>=30nm

customization

Photolithography

quartz

2inch 3inch 4inch 5inch 6inch 8inch

round hole array/square hole array/customization

300nm - 15000nm

>=30nm

customization

Photolithography

metal

2inch 3inch 4inch 5inch 6inch 8inch

round hole array/square hole array/customization

300nm - 15000nm

>=30nm

customization

Photolithography

bonding wafer

material

wafer size

Pattern

line width

registration accuracy

sappire + silicon

2inch 3inch 4inch 5inch 6inch 8inch

customization

300nm - 15000nm

>=30nm

silicon + quartz

2inch 3inch 4inch 5inch 6inch 8inch

customization

300nm - 15000nm

>=30nm

silicon + silicon

2inch 3inch 4inch 5inch 6inch 8inch

customization

300nm - 15000nm

>=30nm

pattern struction wafer（图形晶圆片）

Contact info

pattern struction wafer