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CZ silicon wafers

WaferHome can manufacture the high purity 99.999999999% IC grade silicon wafer

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Specification for CZ Growth Siliocn Wafer

                 
Grade Dimeter Type/dopant Orientaion thickness Resistivity

Flat

Surface/Roughness Geometric parameter
(最优)Prime 25.4mm 50.8mm 76.5mm P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

400um+/-20 400um+/- 20 400um+/-20

0.0001 - 200 Ohm-cm /Customization

N/A 16mm 22.5mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
100mm 125mm 150mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 525um+/-20 625um+/-20 625um+/-20 0.0001 - 200 Ohm-cm /Customization 32.5mm 42.5mm 57.5mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
200mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 725um+/-20 0.0001 - 200 Ohm-cm /Customization nothch/flat polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
300mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 775um+/-20 0.0001 - 200 Ohm-cm /Customization notch/flat polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30umRa<0.5nm
挡片 控片(Dummy) 25.4mm 50.8mm 76.5mm P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

400um+/-20 400um+/- 20 400um+/-20

0.0001 - 200 Ohm-cm /Customization

N/A 16mm 22.5mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
100mm 125mm 150mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 525um+/-20 625um+/-20 625um+/-20 0.0001 - 200 Ohm-cm /Customization 32.5mm 42.5mm 57.5mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
200mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 725um+/-20 0.0001 - 200 Ohm-cm /Customization nothch/flat polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
300mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 775um+/-20 0.0001 - 200 Ohm-cm /Customization notch/flat polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30umRa<0.5nm
extra thick wafer 25.4mm 50.8mm 76.5mm P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

>=1000um customization

0.0001 - 200 Ohm-cm /Customization

N/A 16mm 22.5mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
100mm 125mm 150mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation >=1000um customization 0.0001 - 200 Ohm-cm /Customization 32.5mm 42.5mm 57.5mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
200mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation >2000um customization 0.0001 - 200 Ohm-cm /Customization notch/flat polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
300mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation >2000um customization 0.0001 - 200 Ohm-cm /Customization notch/flat polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
extra thin wafer 25.4mm 50.8mm 76.5mm P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

100um 200um customization

0.0001 - 200 Ohm-cm /Customization

N/A 16mm 22.5mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
100mm 125mm 150mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 1000um 2000um customization 0.0001 - 200 Ohm-cm /Customization 16mm+/-2mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
200mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 1000um 2000um customization 0.0001 - 200 Ohm-cm /Customization 16mm+/-2mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
300mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 1000um 2000um customization 0.0001 - 200 Ohm-cm /Customization 16mm+/-2mm polished/etched polished/polished TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
extra flat wafer 25.4mm 50.8mm 76.5mm P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

400um+/-20 400um+/- 20 400um+/-20

0.0001 - 200 Ohm-cm /Customization

N/A 16mm 22.5mm polished/etched polished/polished TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um Ra<0.5nm
100mm 125mm 150mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 525um+/-20 625um+/-20 625um+/-20 0.0001 - 200 Ohm-cm /Customization 32.5mm 42.5mm 57.5mm polished/etched polished/polished TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um Ra<0.5nm
200mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 725um+/-20 0.0001 - 200 Ohm-cm /Customization nothch/flat polished/etched polished/polished TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um
300mm P(Boron) N(Phos/As/Sb) <100> <111> or special orientation 775um+/-20 0.0001 - 200 Ohm-cm /Customization notch/flat polished/etched polished/polished TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um Ra<0.5nm